Advisory Board F
Programme Chair:
Swastik KAR, Northeastern University, USA
Members:
Luis BALICAS, Florida State University, USA
Maya BAR SADAN, Ben Gurion University, Israel
Francesco BONACCORSO, Istituto Italiano di Tecnologia, Italy
Cinzia CASIRAGHI, University of Manchester, UK
Jean-Christophe CHARLIER, Université Catholique de Louvain, Belgium
Chun-Wei CHEN, National Taiwan University, Taiwan
Kuei-Hsien CHEN, National Taiwan University, Taiwan
Yongsheng CHEN, Nankai University, China
Luigi COLOMBO, Texas Instruments Incorporated, USA
Keshav DANI, Okinawa University, Japan
Toshiaki ENOKI, Tokyo Institute of Technology, Japan
Klaus ENSSLIN, ETH Zurich, Switzerland
Vladimir I. FALKO, Lancaster University, UK
Andrea C. FERRARI, University of Cambridge, UK
Michael S. FUHRER, University of Maryland at College Park, USA
Daisuke FUJITA, NIMS, Japan
Jose GARRIDO, Technical University Munich, Germany
Joshua GOLDBERGER, The Ohio State University, USA
Byung Hee HONG, Seoul National University, South Korea
Karsten HORN, Fritz-Haber-Institut der Max-Planck-Gesellschaft, Germany
Anupama KAUL, University of Texas at El Paso, USA
Jari KINARET, Chalmers University of Technology, Sweden
Taiichi OTSUJI, Tohoku University, Japan
Luca OTTAVIANO, University of L'Aquila, Italy
Vincenzo PALERMO, ISOF - CNR, Bologna, Italy
Marcos PIMENTA, Universidade Federal de Minas Gerais, Brazil
Paolo SAMORI', Université de Strasbourg & CNRS, France
Zexiang SHEN, Nanyang Technological University, Singapore
Dangsheng SU, Institute of Metal Research, CAS, China
Saikat TALAPATRA, Southern Illinois University of Carbondale, USA
Andrew WEE, National University of Singapore, Singapore
Alla ZAK, Holon Institute of Technology, Israel
Hua ZHANG, Nanyang Technological University, Singapore
Swastik KAR, Northeastern University, USA
Members:
Luis BALICAS, Florida State University, USA
Maya BAR SADAN, Ben Gurion University, Israel
Francesco BONACCORSO, Istituto Italiano di Tecnologia, Italy
Cinzia CASIRAGHI, University of Manchester, UK
Jean-Christophe CHARLIER, Université Catholique de Louvain, Belgium
Chun-Wei CHEN, National Taiwan University, Taiwan
Kuei-Hsien CHEN, National Taiwan University, Taiwan
Yongsheng CHEN, Nankai University, China
Luigi COLOMBO, Texas Instruments Incorporated, USA
Keshav DANI, Okinawa University, Japan
Toshiaki ENOKI, Tokyo Institute of Technology, Japan
Klaus ENSSLIN, ETH Zurich, Switzerland
Vladimir I. FALKO, Lancaster University, UK
Andrea C. FERRARI, University of Cambridge, UK
Michael S. FUHRER, University of Maryland at College Park, USA
Daisuke FUJITA, NIMS, Japan
Jose GARRIDO, Technical University Munich, Germany
Joshua GOLDBERGER, The Ohio State University, USA
Byung Hee HONG, Seoul National University, South Korea
Karsten HORN, Fritz-Haber-Institut der Max-Planck-Gesellschaft, Germany
Anupama KAUL, University of Texas at El Paso, USA
Jari KINARET, Chalmers University of Technology, Sweden
Taiichi OTSUJI, Tohoku University, Japan
Luca OTTAVIANO, University of L'Aquila, Italy
Vincenzo PALERMO, ISOF - CNR, Bologna, Italy
Marcos PIMENTA, Universidade Federal de Minas Gerais, Brazil
Paolo SAMORI', Université de Strasbourg & CNRS, France
Zexiang SHEN, Nanyang Technological University, Singapore
Dangsheng SU, Institute of Metal Research, CAS, China
Saikat TALAPATRA, Southern Illinois University of Carbondale, USA
Andrew WEE, National University of Singapore, Singapore
Alla ZAK, Holon Institute of Technology, Israel
Hua ZHANG, Nanyang Technological University, Singapore